Electrical properties and topography of SnO2 thin films prepared by reactive sputtering

Journal article

Peer reviewed

J.-L BROUSSEAU, H BOURQUE, A TESSIER and R. M LEBLANC

Applied surface science, Vol.108(3), pp.351-358

1997

Abstract

Other inorganic semiconductors

Structure and morphology; thickness

Exact sciences and technology

Condensed matter: structure, mechanical and thermal properties

Electrical properties of specific thin films

Thin film structure and morphology

Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures

Condensed matter: electronic structure, electrical, magnetic, and optical properties

Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)

Physics

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Collaboration types: Domestic collaboration; International collaboration
Citation topics: 2 Chemistry; 2.74 Photocatalysts; 2.74.16 ZnO
Web Of Science research areas: Chemistry, Physical; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
ESI research areas: Materials Science

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Source: InCites

Title: Electrical properties and topography of SnO2 thin films prepared by reactive sputtering
Creators: J.-L BROUSSEAU - Department of Chemistry, University of Miami, 1301 Memorial Drive, Coral Gables, FL 33124, United States
H BOURQUE - Department of Chemistry, University of Miami, 1301 Memorial Drive, Coral Gables, FL 33124, United States
A TESSIER - Department of Chemistry, University of Miami, 1301 Memorial Drive, Coral Gables, FL 33124, United States
R. M LEBLANC - Department of Chemistry, University of Miami, 1301 Memorial Drive, Coral Gables, FL 33124, United States
Publication Details: Applied surface science, Vol.108(3), pp.351-358
Publisher: Elsevier Science; Amsterdam
Academic Unit: Leadership Department; College of A&S; A&S - Chemistry
Language: English
Resource Type: Journal article
Record Identifier: 991031576560402976