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Matrix-Assisted Dip-Pen Nanolithography (MA-DPN) and Polymer Pen Lithography (MA-PPL)
Journal article   Open access  Peer reviewed

Matrix-Assisted Dip-Pen Nanolithography (MA-DPN) and Polymer Pen Lithography (MA-PPL)

Ling Huang, Adam B Braunschweig, Wooyoung Shim, Lidong Qin, Jong Kuk Lim, Sarah J Hurst, Fengwei Huo, Can Xue, Jae-Won Jang and Chad A Mirkin
Small (Weinheim an der Bergstrasse, Germany), Vol.6(10), pp.1077-1081
2010-05-21
PMCID: PMC3517014
PMID: 19885890

Abstract

Dip-Pen Nanolithography Nanomaterials Poly(ethylene glycol) Polymer Pen Lithography
The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in size, shape and solubility of these materials. Matrix-assisted dip-pen nanolithography and polymer pen lithography provide a solution to this problem by utilizing a polymeric matrix that encapsulates the nanomaterials and delivers them to surfaces with precise control of feature size.
url
https://doi.org/10.1002/smll.200901198View
Published (Version of record) Open

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Domestic collaboration
International collaboration
Citation topics
2 Chemistry
2.167 Microelectromechanical Systems
2.167.305 Self-Assembled Monolayers
Web Of Science research areas
Chemistry, Multidisciplinary
Chemistry, Physical
Materials Science, Multidisciplinary
Nanoscience & Nanotechnology
Physics, Applied
Physics, Condensed Matter
ESI research areas
Materials Science

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