Abstract
A focused ion beam (FIB) fabricated nanolaser is demonstrated to be able to focus light with power of over
250
nW
into a
30
nm
spot. To fabricate a nanolaser, a
100
nm
thick aluminum film was deposited on the emitting edge of a diode laser. FIB was used to etch various apertures into the film. The power was measured by a scanning near-field optical microscope in the near-field regime with a
10
nm
separation between the probe and the air bearing surface of the nanolaser. Out of four different shapes under study, "C"-shape aperture was found to have the highest throughput.
