Abstract
The communication illustrates how focused ion beam-modified nanomagnetic probes could be used to image patterned media with the resolution of a few nanometers only and thus suitable for densities above 10 terabit/in(2) . To take advantage of the modified probes, the measured signal is deconvolved with the sensitivity field inherent to the probe. Focused ion beam is used to trim silicon probes into the probes with the adequate geometry to satisfy the requirements on the sensitivity field. The measurements indicate that the resolution of magnetic force microscopy could be made comparable with the resolution of atomic force microscopy.
