Abstract
Polymer waveguides with 45Y mirrors are fabricated by vacuum assisted microfluidic (VAM) soft lithographic technique for card-to-backplane optical interconnect applications. Waveguide array structures with inclined surfaces in SU-8 photoresist for PDMS mold are fabricated by prism assisted UV exposure. Sample surface reflected UV light is utilized to eliminate undercut structures and to accomplish the inclined mirror surfaces on both ends of the straight waveguide segments by one-step UV exposure. Polymer waveguides with 45Y embedded mirrors demonstrated about 0.49 dB/cm propagation loss and 67% mirror coupling efficiency.
