Abstract
The paper describes methodologies for deposition of nanostructured films in single step processes using flame aerosol reactors. An understanding of the process parameters such as precursor feed rate, temperature histories and residence times that control resultant film parameters such as thickness, crystallinity and morphology are developed. Control of temperature profiles allow control of sintering rates to produce desired nanostructured thin films. These films are then tested for photocurrent generation under uv light illumination - and overall conversion efficiencies of around 5 % are readily obtained. Results of the study indicate that conditions could be optimized to improve water splitting efficiencies.